ASML ships new lithography machine NXT2000i: for 7nm/5nm DUV process

According to foreign media reports, lithography machine master ASML has begun to ship new products Twinscan NXT: 2000i DUV (NXT: 2000i dual workpiece table deep UV lithography machine), can be used for 7nm and 5nm nodes. NXT: 2000i will be NXE: 3400B EUV lithography machine is an effective complement, after all, TSMC / GF's first generation 7nm is based on DUV process.

At the same time, NXT:2000i has become the highest overlay product of ASML, reaching the same 1.9nm as 3400B (2.4nm for 5nm and 3.5nm for 7nm). ASML will start at the end of this quarter. The Twinscan NXT:2000i is available at an undisclosed price. Currently, the NXE:3400B EUV lithography machine is priced at $120 million, and the traditional ArF immersion lithography machine (14nm node) is priced at $72 million, NXT: The 2000i is definitely between the two.

Finally, a brief introduction to ASML, which was born out of Philips' lithography R&D team in the Netherlands, accounted for 70% of the global lithography machine market in 2017. It is an absolute brother, followed by Canon, Nikon and Shanghai Microelectronics.

The integrated circuit undergoes various processes such as material preparation, masking, photolithography, etching, cleaning, doping, mechanical polishing, etc. in the fabrication process, among which the photolithography process is the most critical, and it is the advanced manufacturing process of the entire integrated circuit industry. An important indicator, that is, the transfer between the mask pattern and the silicon substrate pattern during the chip manufacturing process.

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