'In the leading IC technology, wafer and chip manufacturers have almost no room for error,' said Oreste Donzella, senior vice president and chief marketing officer of KLA-Tencor. 'The key dimensions of the new generation of chips are so small that they are bare silicon. On wafer or coating monitoring wafers, the size of defects that can cause yield loss is already less than the detection limit of existing equipment monitoring systems. In addition, whether it is 193i or EUV, the second key in defect detection is how to reliably detect Defects in yield loss introduced early in the lithography process. Our R&D team developed two new defect detection systems—one for patternless/monitor wafers and one for patterned wafers—for Engineers provide critical assistance in quickly and accurately solving these problems. '
The Surfscan SP Patternless Wafer Defect Detection System uses a substantially innovative light source and sensor architecture that delivers sensitivity that changes the industry's face. Its resolution is epoch-making compared to the previous generation of the market-leading Surfscan system. The leap of resolution is the key to detecting the smallest killer defects. The new resolution range allows for real-time classification of many defect types (such as particles, scratches, slip lines and stacking faults) - no need from Surfscan The wafer is removed from the device or affects system throughput. At the same time, precise control of the peak power density allows the Surfscan SP7 to detect thin, delicate EUV photoresist materials.
The Voyager 1015 patterned wafer defect inspection system combines new light sources, signal acquisition and sensors to fill the industry's long-term gap in post-development inspection (ADI). This revolutionary laser-scatter detection system enhances sensitivity while also improving sensitivity. Noise signals can be reduced – and the results are much faster compared to the best alternatives. Like the new Surfscan SP7, the Voyager system has a unique control of power density for sensitive and sensitive photoresist materials after development. On-line inspection. High-volume capture of critical defects in lithography systems and other fab modules allows process problems to be quickly identified and corrected.
The first batch of Surfscan SP7 and Voyager 1015 systems have been deployed in the world's leading wafer, equipment and chip manufacturer's facilities, along with KLA-Tencor's eDR electron beam defect inspection and analysis system and Klarity data analysis system. Identify process control issues at the root. To meet the high performance and productivity requirements of wafer and chip manufacturers, the Voyager and Surfscan SP7 systems are powered by KLA-Tencor's global integrated services network.