Synopsys Custom Design Platform provides custom design for Samsung 7LPP process technology

Synopsys announced that the Custom Design Platform has been successfully certified by Samsung Electronics for use in the Samsung 7nm LPP (Low Power +) process. The Samsung 7LPP process is the first semiconductor process to use extreme ultraviolet (EUV) lithography. Technology, compared to 10nm FinFET, can greatly reduce complexity and provide higher yield and faster turnaround time. Synopsys custom design tools have been updated for Samsung 7LPP related requirements. In addition, Samsung will also provide Synopsys' Process Design Kit (PDK) and custom design reference flow.

The Sixth Technology Custom Design Platform has been certified by the Samsung 7LPP process technology. The platform is based on the Custom Compiler custom design and layout environment, and includes HSPICE, FineSim SPICE and CustomSim FastSPICE circuit simulation, StarRC parasitic extraction and IC Validator physical verification. Supporting efficient 7LPP custom design, Synopsys and Samsung jointly developed a reference flow that includes a set of instructions describing the key requirements for 7nm design and layout. These instructions include sample design data and steps to perform typical design and layout tasks. Topics covered include electrical rule checking, circuit simulation, mixed-signal simulation, Monte Carlo analysis, layout, parasitic analysis and electromigration.

In order to pass Samsung certification, Synopsys has optimized the tools to meet the stringent requirements of 7nm designs, including: • Accurate FinFET device modeling and device aging effects • Advanced Monte Carlo simulation for efficient analysis • High-performance transient noise simulation for analog and RF design • High-performance post-layout simulation for parasitic sensing design and simulation • Dynamic circuit ERC for device voltage checking • High-performance transistor-level EM/IR analysis, maximizing Reduce over-design • Efficient symbolic editing of FinFET device arrays • EUV support • Cover-based via resistance extraction

Ryan Sanghyun Lee, Vice President of Samsung Marketing Team, said: 'Our custom design cooperation with Synopsys has grown significantly over the past two years. Through this collaboration, we have added Synopsys Custom Design Platform support for the 7LPP process. , including custom design reference flow based on Synopsys tools. '

Bijan Kiani, Vice President of Product Marketing at Synopsys, said: 'We have been working closely with Samsung to simplify the custom design using FinFET process technology. We have partnered with certification tools, reference processes, PDK, simulation models and run sets to help Samsung customers. Ability to use the 7LPP process for reliable custom designs. '