Samsung works with ARM to optimize 7nm and 5nm process chips

Samsung's 7nm LPP process will be initially mass-produced in the second half of 2018. The first intellectual property using EUV extreme ultraviolet lithography technology is also under study. It is expected to be officially launched in the first half of 2019. Samsung's next-generation 5nm LPE process is 7nm EUV. Process technology improvements, resulting in a smaller core area, and lower power consumption.

In order to catch up with TSMC, Samsung introduced EUV technology in the first generation of the 7-nanometer (LPP) process. However, TSMC is also not a fuel-efficient lamp. In addition to actively deploying 7-nanometer process technology, it has also announced the launch of 5 nanometers in South Branch in early 2018. In order to reduce the gap with TSMC, Samsung officially announced the joint venture with the intellectual property giant (ARM) on the 5th. The agreement will further optimize the 7nm and 5nm process chips. .

ARM also previously published Artisan physical IP based on Samsung's 7nm LPP process and 5nm LPE process, including high-resolution logic architecture, memory compiler synthesis kit, 1.8V and 3.3V general-purpose input and output (GPIO) libraries, etc. In addition, Samsung's 7nm LPP process and 5nm LPE process enable the ARM processor to be optimized and brought to market faster.

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